The Optimization of 3.3 kV 4H-SiC JBS Diodes
نویسندگان
چکیده
The article reports a comprehensive study optimizing the OFF- and ON-state characteristics of 3.3 kV junction barrier Schottky (JBS) diodes made using nickel, titanium, molybdenum contact metals. In this design, same implants used in optimized termination region are to form P-regions JBS active area. width spacing varied optimize both ON- OFF-state device. All tested displayed high blocking voltages ideal turn-on up rated current 2 A. However, leakage height (SBH) were found scale with ratio p + regions. Full Schottkys, without regions, those very wide regions had lowest SBH (1.61 eV for Ni, 1.11 Mo, 0.87 Ti) highest leakage. Those openings $2 ~\mu \text{m}$ leakage, but they suffered severe pinching from surrounding increasing their SBH. best performing Ni Mo devices narrowest pitch, implants/Schottky wide. These offered balanced device excellent performance, while guaranteed relatively low forward voltage drop.
منابع مشابه
Graphite based Schottky diodes on Si, GaAs, and 4H-SiC
Todd Schumann, Sefaattin Tongay, Arthur F. Hebard Department of Physics, University of Florida, Gainesville FL 32611 This article demonstrates the formation of Schottky diodes on silicon (Si), gallium arsenide (GaAs), and 4H-silicon carbide (4H-SiC) using the semimetal graphite. The forward bias characteristics follow thermionic emission theory, and the extracted Schottky barrier heights closel...
متن کاملAvalanche Multiplication and Breakdown in 4H-SiC Diodes
The measured photomultiplication and excess noise characteristics of two 4H-SiC p-i-n diodes, with i-region widths of 0.105 μm and 0.285 μm, were modelled using a nonlocal multiplication model to determine the ionization threshold energies and the impact ionization coefficients of 4H-SiC. The modelled ionization coefficients accurately predicted the breakdown voltage of a 0.485 μm p-i-n structu...
متن کاملDemonstration of the first 9.2 kV 4H-SiC bipolar junction transistor
– This paper reports the first demonstration of a 9.2kV 4H-SiC bipolar junction transistor (BJT) based on a 50 μm, 7x10cm doped drift layer, achieving an emitter current density of 150A/cm at VCEO=5V. A much larger area BJT of identical wafer design with negligible current spreading effect would have an RSP_ON equal to 49mΩ-cm limited only by the specific resistance of the 50um drift layer. A D...
متن کامل4h-sic Power Schottky Diodes. on the Way to Solve Size Limiting Issues
In this paper we report on experimental results in solving defect-related issues limiting the size and performance of 4H-SiC based power Schottky diodes. Several techniques improving wafer quality were used in line to fabricate power Schottky diodes with high current capability for blocking voltage over 600 V. Results of X-ray investigation of wafers on every step of treatment from initial wafe...
متن کاملNumerical Simulation and Optimization for 900V 4H-SiC DiMOSFET fabrication
We report the simulation results of 25μm half cell pitch vertical type 4H-SiC DiMOSFET using the general-purpose device simulator MINIMOS-NT. The best trade-off between breakdown voltage and on-resistance in terms of BFOM is around 19MW/cm 2 with a p-well spacing 5μm. The specific on -resistance, RON, sp, simulated with VGS=10V and VDS=1V at room temperature, is around 22.76mΩcm 2 . An 900V bre...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: IEEE Transactions on Electron Devices
سال: 2022
ISSN: ['0018-9383', '1557-9646']
DOI: https://doi.org/10.1109/ted.2021.3129705